Place of Origin: | China |
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Brand Name: | Newradar Gas |
Certification: | ISO/DOT/GB |
Model Number: | N/A |
Minimum Order Quantity: | 1000 kilogram |
Price: | negotiation |
Packaging Details: | standard export packing:each cylinder to be protected by two poly-nets,standing on wooden pallet wrapped by plastic film |
Delivery Time: | 15-25 working days after received your payment |
Payment Terms: | L/C, , T/T, Western Union, MoneyGram |
Supply Ability: | 3,00 ton per month |
Physical Properties: | Solid Phase Has Two Polymorphs | Vapor Density:: | 4.823 (air = 1) |
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Grade: | Industry Grade | Other Names: | 1,1,1,2,2,2-Hexafluoroethane |
Appearance:: | Colorless Liquefied Gas | UN NO.: | 2193 |
Grade Standard: | Electron Grade Industrial Grade | Synonyms: | 1,1,1,2,2,2-Hexafluoroethane;C2F6;ethane,hexafluoro-;Ethylhexafluoride;f116;F-116;FC1160;Fluorocarbon 116 |
Application: | Electronics Equipment,transformer,refrigerating Fluid | MF:: | C2F6 |
MW:: | 138.01 | ||
Highlight: | electric gas,purity plus specialty gases |
CAS: 76-16-4
Chinese name: hexafluoroethane
English name: Hexafluoroethane
Alias: R116; perfluoroethane
Molecular formula: C2F6; CF3CF3
Molecular weight: 138.0
Melting point: -101 ° C
Density: relative density (water = 1) 1.61;
Vapor pressure:
Solubility: slightly soluble in water
Stability: stable
Appearance and character: colorless, odorless, non-flammable gas, above 24.3 ℃ can not keep the liquid, usually installed in high pressure cylinder
Specifications:
1. Physical properties
Commodity |
Hexafluoroethane |
Molecular Formula |
R116 |
CAS No |
76-16-4 |
UN No. |
2193 |
Hazardous Class |
2.2 |
MF: |
C2F6 |
Cylinder Capacity |
40L, 500L |
Filling Weight |
530kg/500L refillable cylinder 20kg/40L refillable cylinder |
Storage and Transportation |
Use, store and transport below 45C. Store in cool and well-ventilated areas. Keep away from fire, heat, sunlight and flammable substances. Handle carefully when loading and unloading to avoid damages to gas cylinders and accessories. |
2. Typical technical data
Purity, % | ≥99.8 |
Moisture, PPm | ≤10 |
Acidity, PPm | ≤1 |
Vapor Residue, PPm | ≤100 |
Appearance | Colorless, No turbid |
Odor | No Strange Stench |
Molecular Weight | 66.1 |
Boiling Point, °C | -24.7 |
Critical Temperature, °C | 113.5 |
Critical Pressure, Mpa | 4.58 |
Specific Heat of Liquid, 30°C, [KJ/(kg°C)] | 1.68 |
ODP | 0 |
GWP | 0.014 |
Applications:
Multi - Functional Etching Technology | In The Production Of Semiconductor etching of metal |
The Metal Substrate |
It can be used in the selective etching of metal silicon metal and metal oxide. Under prolonged exposure to fire or intense heat the containers may rupture violently and rocket. |